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MetalKeen manufactures custom stainless steel water cooling flanges and liquid-cooled chamber flanges for semiconductor processing equipment. Precision CNC machined from 304 and 316L stainless steel, our water-cooled flanges feature internal cooling channels, vacuum helium leak-tight sealing, and electropolished surfaces to meet the stringent cleanliness and thermal stability requirements of etching, deposition, and lithography systems.
A water cooling flange (also called a liquid-cooled flange, water jacket flange, or cooled chamber flange) is a precision-machined stainless steel interface component used in semiconductor vacuum process chambers. It serves two critical functions:
Vacuum sealing — Provides a leak-tight connection between chamber sections, electrodes, or viewport assemblies
Thermal management — Circulates deionized (DI) water or fluorinated coolant through internal channels to maintain precise temperature control of chamber walls, electrodes, or substrate holders
In semiconductor manufacturing, even ±1°C temperature variation can affect film deposition uniformity or etch profile accuracy. MetalKeen's custom water cooling flanges ensure thermal stability, vacuum integrity, and particle-free surfaces for sub-micron process control.
Table
Material | Grade | Application | Surface Finish |
|---|---|---|---|
316L Stainless Steel | S31603 / 1.4404 | Standard for corrosive process gases (Cl₂, BCl₃, NF₃) | Electropolished Ra ≤ 0.4 μm; passivated |
304 Stainless Steel | S30400 / 1.4301 | General water cooling, non-corrosive ambient | Electropolished or mechanically polished |
316LN Stainless Steel | S31653 | High-strength vacuum flanges; reduced magnetic permeability | Precision ground + electropolish |
904L Stainless Steel | N08904 | Aggressive chemistries; high chloride environments | Electropolished Ra ≤ 0.25 μm |
Why 316L for Semiconductor Cooling Flanges?
Ultra-low carbon (≤0.03%) — Prevents chromium carbide precipitation and intergranular corrosion
Excellent corrosion resistance — Withstands halogen-based etch chemistries and DI water
Non-magnetic — Critical for ion implant and e-beam lithography equipment
Superior cleanability — Electropolished surface minimizes particle generation
Table
Flange Type | Description | Application |
|---|---|---|
ISO-K / ISO-F Cooled Flange — Large-diameter vacuum connection | Internal annular cooling channel between bolt circles | CVD/PVD chamber body flanges; load lock interfaces |
CF (ConFlat) Cooled Flange — Ultra-high vacuum (UHV) metal seal | Knife-edge seal with integrated water jacket | UHV deposition chambers; molecular beam epitaxy (MBE) |
KF (NW) Cooled Flange — Quick-connect vacuum flange | Compact water cooling for small ports and adapters | Foreline connections; vacuum gauge ports |
ASA / ANSI Cooled Flange — Bolted flat-face flange | O-ring seal with surrounding cooling channel | Medium vacuum process modules |
Custom Chamber Interface Flange — Proprietary geometry matched to OEM chamber | Multi-zone cooling; integrated gas feedthroughs | Etch chambers; ALD reactors; ion implanters |
Electrode Cooling Flange — RF or DC electrode base with direct cooling | High-density cooling channels under plasma-facing surface | ICP etchers; PVD magnetron sputtering cathodes |
Table
Specification | Details |
|---|---|
Flange Diameter | DN16 (KF16) – DN630 (ISO630); custom up to 1200 mm |
Overall Thickness | 15 mm – 150 mm (depending on cooling channel depth) |
Cooling Channel Design — Internal | Concentric annular groove, spiral channel, or conformal pocket |
Channel Sealing Method — Internal | Welded cover plate, electron beam welded closure, or brazed plug |
External Connection — Inlet/Outlet | NPT, BSP, VCR, or Swagelok tube fittings; custom manifold blocks |
Vacuum Seal Surface — Flatness | ≤ 0.01 mm (CF knife-edge); ≤ 0.05 mm (ISO O-ring groove) |
Bolt Hole Pattern — Tolerance | ±0.05 mm relative to center; true position per drawing |
Surface Finish — Vacuum side | Electropolished Ra ≤ 0.4 μm (standard); Ra ≤ 0.25 μm (UHV) |
Leak Rate — Helium mass spec | ≤ 1×10⁻⁹ Pa·m³/s (standard); ≤ 1×10⁻¹⁰ Pa·m³/s (UHV grade) |
Table
Step | Process | Quality Control |
|---|---|---|
Material Verification — PMI spectrometer + MTR review | Confirm 316L chemistry and heat number | Reject if non-conforming |
Rough Machining — CNC milling / turning | Block machining to near-net shape | Dimensional check |
Cooling Channel Machining — Deep hole drilling, pocket milling, or channel routing | Internal waterway geometry | Borescope inspection; flow simulation validation |
Channel Closure — TIG welding, EB welding, or diffusion bonding | Seal internal channels hermetically | 100% leak test after closure |
Precision Machining — CNC finishing of seal faces, bolt holes, and fitting ports | Achieve vacuum-grade tolerances | CMM verification; surface profilometer |
Surface Treatment — Electropolishing + passivation | Remove machining burrs; enrich chromium layer | Ra measurement; visual inspection |
Cleaning — Ultrasonic + DI water rinse + cleanroom packaging | Remove all particles and residues | Particle counter verification |
Leak Testing — Vacuum helium mass spectrometer | Detect micro-leaks in welds and seals | Certificate per test |
Final Inspection — Dimensional, visual, functional | Full inspection report | Documentation for shipment |
Table
Test | Method | Standard | Purpose |
|---|---|---|---|
PMI (Positive Material Identification) | XRF handheld spectrometer | ASTM E415 | Verify 316L alloy grade and chemistry |
Dimensional Inspection | CMM (Coordinate Measuring Machine) | ISO 9013 | Verify bolt pattern, flatness, concentricity |
Surface Roughness | Contact profilometer | ISO 4287 | Confirm Ra ≤ 0.4 μm (electropolished) |
Vacuum Helium Leak Test | Mass spectrometer leak detector | ASTM E498 / ISO 20485 | Verify ≤ 10⁻⁹ Pa·m³/s leak rate |
Hydrostatic Pressure Test — Cooling circuit | DI water at 1.5× operating pressure | ASME B31.3 | Validate channel integrity and seal strength |
Thermal Cycle Test — Optional | Rapid heating/cooling of flange | Customer spec | Validate thermal fatigue resistance |
Particle Count — Cleanroom inspection | Optical particle counter | SEMI F104 / ISO 14644 | Ensure particle-free surface for vacuum service |
Our stainless steel water cooling flanges are used in critical process equipment:
Table
Process Tool | Flange Function | Cooling Requirement |
|---|---|---|
ICP Etch Chamber — Inductively coupled plasma etcher | Chamber body flange; RF electrode base | High heat flux from plasma; ±0.5°C control |
PVD Sputtering System — Physical vapor deposition | Magnetron cathode cooling flange; chamber wall flange | Target heat dissipation; thermal uniformity |
CVD Reactor — Chemical vapor deposition | Showerhead electrode flange; susceptor support | Precise wall temperature for film uniformity |
ALD Chamber — Atomic layer deposition | Reaction chamber flange; precursor delivery interface | Rapid thermal cycling; no thermal drift |
Ion Implanter — Beam line and process chamber | Beam dump flange; target chamber interface | High-power beam heat removal |
Lithography Track — Coater/developer module | Process bowl flange; thermal chuck mount | Chemical resistance + temperature stability |
Wafer Handling Vacuum Chamber — Load lock, transfer chamber | Chamber partition flange; gate valve interface | Maintain thermal equilibrium during wafer transfer |
✅ Semiconductor-Grade Materials — 316L, 316LN, and 904L with full PMI verification
✅ Vacuum-Leak-Tight Construction — Helium leak tested to 10⁻⁹ Pa·m³/s or better
✅ Precision CNC Machining — Tolerances to ±0.01 mm on seal surfaces and bolt patterns
✅ Internal Cooling Channel Expertise — Deep hole drilling, pocket milling, and hermetic closure welding
✅ Electropolished Surfaces — Ra ≤ 0.4 μm for particle-free vacuum environments
✅ Cleanroom Packaging — Double-bagged with nitrogen purge for cleanroom entry
✅ Custom Engineering — Designed to your chamber drawings, thermal models, and vacuum specs
Q1: Why is 316L stainless steel the preferred material for semiconductor water cooling flanges? 316L stainless steel is preferred because it combines excellent corrosion resistance (withstanding halogen etch chemistries and DI water), ultra-low carbon content (preventing weld decay and intergranular corrosion), non-magnetic properties (critical for ion beam and e-beam equipment), and superior electropolishing response (achieving Ra ≤ 0.4 μm for particle-free vacuum surfaces). It is the industry standard for all wetted and vacuum-facing components in semiconductor process equipment.
Q2: How do you ensure the internal cooling channels are leak-free? We manufacture cooling channels using precision CNC machining (deep hole drilling and pocket milling) followed by hermetic closure via TIG welding, electron beam welding, or diffusion bonding. Every flange undergoes vacuum helium leak testing (sensitivity to 10⁻⁹ Pa·m³/s) and hydrostatic pressure testing at 1.5× operating pressure to verify absolute leak integrity before shipment.
Q3: What vacuum flange standards can you manufacture to? We manufacture water cooling flanges compatible with ISO-K, ISO-F, CF (ConFlat), KF (NW), and ASA/ANSI standards. Custom proprietary flange geometries matched to specific OEM chambers (Applied Materials, Lam Research, TEL, ASM, etc.) can be engineered from your drawings or reverse-engineered from samples.
Q4: What surface finish do you provide for semiconductor vacuum flanges? Our standard finish for vacuum-facing surfaces is electropolishing to Ra ≤ 0.4 μm followed by citric acid passivation per ASTM A967. For UHV (ultra-high vacuum) applications, we can achieve Ra ≤ 0.25 μm with enhanced electropolishing. All surfaces are cleaned in an ultrasonic DI water bath and cleanroom-packaged to prevent particulate contamination.
Q5: Can you integrate gas feedthroughs, electrical connectors, or sensors into the cooling flange? Yes. We design and machine multi-functional flanges that combine internal cooling channels with through-holes for gas lines, conductor feedthroughs, thermocouple ports, and viewing windows. This reduces chamber complexity and improves thermal uniformity by consolidating functions into a single precision-machined component.
Q6: What coolant connections do you offer? We provide NPT, BSP, VCR face-seal, and Swagelok compression fittings for cooling water inlet/outlet. For high-purity DI water systems, we recommend VCR or orbital-welded tube stubs to eliminate thread sealant contamination. Custom manifold blocks with multiple zone connections are also available.
Q7: What is the typical lead time for custom semiconductor cooling flanges? Standard lead time is 4–6 weeks for single-piece prototypes and 6–8 weeks for small production lots. Complex multi-zone flanges with extensive electropolishing and UHV leak testing may require 8–10 weeks. Expedited delivery is available for tool refurbishment schedules and chamber upgrade projects.
